Online Publications

Three-Dimensional Mask Transmission Simulation Using a Single Integral Equation Method
Michael S. Yeung and Eytan Barouch

Application of the Hybrid Finite-Difference Time-Domain Method to Modeling Curved Surfaces in Three-Dimensional Lithography Simulation
Michael S. Yeung and Eytan Barouch

Application of the Hybrid FDTD-FETD Method to Dispersive Materials
Michael S. Yeung

Incident Wave Source for Finite-Difference Time-Domain Computation of Electromagnetic Scattering for Objects Embedded in Layered Dispersive Media
Michael S. Yeung

Limitation of the Kirchhoff Boundry Conditions for Aerial Image Simulation in 157-nm Optical Lithography
Michael S. Yeung, Eytan Barouch

Modeling High Numerical Aperture Optical Lithography
Michael S. Yeung

Measurement of Wave-Front Aberrations in High-Resolution Optical Lithographic Systems from Printed Photoresist Patterns
Michael S. Yeung

Spontaneous Emission near an Absorbing Dielectric Surface
Michael S. Yeung and T.K. Gustafson

Single Integral Equation for Electromagnetic Scattering by Three-Dimensional Homogeneous Dielectric Objects
Michael S. Yeung

Illuminator optimization for projection printing
E. Barouch, S. L. Knodle, S. A. Orszag, M. Yeung

Offline Publications

Journal Papers

1. M. S. Yeung and E. Barouch, "Limitation of the Kirchhoff Boundary Conditions

for Aerial Image Simulation in 157-nm Optical Lithography", IEEE Electron Device Letters, vol. 21, 433-435 (2000).

2. M. S. Yeung, "Solution of Electromagnetic Scattering Problems Involving Three -Dimensional Homogeneous Dielectric Objects by the Single Integral Equation Meth od", J. Scientific Computing, vol. 15, no. 1 (2000).

3. M. S. Yeung, "Measurement of Wave-Front Aberrations in High-Resolution Optical Lithographic Systems from Printed Photoresist Patterns", IEEE Trans. Semiconductor Manufacturing, vol. 13, 24-33
(2000)

4. M. S. Yeung, "Single Integral Equation for Electromagnetic Scattering from Three-Dimensional Homogeneous Dielectric Objects", IEEE Trans. Antennas and Propagation, vol. 47, 1615-1622 (1999)

5. M. S. Yeung, "Incident Wave Source for Finite-Difference Time-Domain Computation of Electromagnetic Scattering for Objects Embedded in Layered Dispersive Media", J. Scientific Computing, vol. 14, 121-145 (1999)

6. M. S. Yeung, "Application of the Hybrid FETD-FDTD Method to Dispersive Materials", Microwave and Optical Technology Letters, vol. 23, 238-242 (1999)

7. M. S. Yeung and T. K. Gustafson, "Spontaneous Emission near an Absorbing Dielectric Surface", Phys. Rev. A, vol. 54, 5227-5242 (1996)

8. C. A. Spence, R. A. Ferguson, M. Yeung, S. Das, J. M. Hutchinson and A. R. Neureuther, "An Investigation of Some Depth of Focus Issues in High Numerical Aperture Projection Lithography Systems by Experiment and Simulation", J. Vac. Sci. Technol. B, vol. 8, 1735-1739 (1990)

9. B. C. Murray, W. R. Ward and S. C. Yeung, "Periodic Insolation Variations on Mars", Science, vol. 180, 638-640 (1973)

Conference Papers

1. M. S. Yeung and E. Barouch, "157-nm Lithography Simulation Using a Finite-Difference Time-Domain Method with Oblique Incidence in a Multilayered Medium", Proc. SPIE, vol. 4000 (in press, 2000)

2. M. S. Yeung and E. Barouch, "Application of the Hybrid Finite-Difference Time-Domain Method to Modeling Curved Surfaces in Three-Dimensional Lithography Simulation", Proc. SPIE, vol. 3679, 1093-1103
(1999)

3. M. S. Yeung and E. Barouch, "Three-Dimensional Mask Transmission Simulation Using a Single Integral Equation Method", Proc. SPIE, vol. 3334, 704-713 (1998)

4. M. S. Yeung and E. Barouch, "Use of Rigorous Electromagnetic Simulation to Evaluate the Effectiveness of Optical Proximity Correction for Nonplanar Lithography", Mat. Res. Soc. Symp. Proc. vol. 490, 173-179 (1998)

5. M. S. Yeung and E. Barouch, "Optimization of Bottom Antireflective Coating for Nonplanar Lithography by Three-Dimensional Electromagnetic Simulation", Proc. SPIE, vol. 3183, 91-103
(1997)

6. M. S. Yeung and E. Barouch, "Three-Dimensional Nonplanar Lithography Simulation Using a Periodic Fast Multipole Method", Proc. SPIE, vol. 3051, 509-521 (1997)

7. M. S. Yeung and A. R. Neureuther, "Three-Dimensional Reflective-Notching Simulation Using Multipole Accelerated Physical-Optics Approximation", Proc. SPIE, vol. 2440, 395-409 (1995)

8. J. J. Helmson, M. Yeung, D. Lee and A. R. Neureuther, "SAMPLE-3D Benchmarks Including High NA and Thin Film Effects", Proc. SPIE, vol. 2197, 478-488 (1994)

9. M. S. Yeung, D. Lee, R. Lee and A. R. Neureuther, "Extension of the Hopkins Theory of Partially Coherent Imaging to Include Thin-Film Interference Effects", Proc. SPIE, vol. 1927, 452-463 (1993)

10. M. S. Yeung and A. R. Neureuther, "Improvement of the Physical-Optics Approximation for Topography Simulation in Optical Lithography", Proc. SPIE, vol. 1927, 833-846 (1993)

11. P. Y. Yan, M. Yeung and H. Gaw, "Printability of Pellicle Defects in DUV 0.5-Micron Lithography", Proc. SPIE, vol. 1604, 106-117 (1992)

12. M. S. Yeung, "Photolithography Simulation on Nonplanar Substrates", Proc. SPIE, vol. 1264, 309-321 (1990)

13. M. S. Yeung, "Modeling High Numerical Aperture Optical Lithography", Proc. SPIE, vol. 922, 149-167 (1988)

14. M. S. Yeung, "Modeling Aerial Images in Two and Three Dimensions", Proc. Kodak Microelectronics Seminar, Interface 85, 115-126 (1986)

15. M. Yeung, J. Langston and C. Sparkes, "Increasing the Registration Accuracy of Step and Repeat Systems through Software Improvement", Proc. SPIE, vol. 565, 32-40 (1985)

16. E. J. Groth and S. C. Yeung, "Optical Pulsations from the Her X-1 - HZ Her System.", Bull. Am. Astron. Society, Abstract of the 141st Meeting, 410 (1973)